ISSN: 2249–9504
CAS CODEN: IJPCDX

DEVELOPMENT OF COBALT SCHIFF BASE PRECURSORS FOR NANOCRYSTALLINECOBALT OXIDE THIN FILM BY THERMAL CVD METHOD

Abstract

Author(s): P. Sravanthi, C. Chandrakala, KS. Nagaraja, B. Jeyaraj

A novel precursor sources fornanocrystalline metal oxide thin filmswere synthesized by Thermal CVD using the following Schiff base complexes, bis(salicylaldehydato) cobalt(II) [Co(sal)2.(H2O)2](1), bis(salicylaldiminoato) cobalt(II) [Co(salim)2.(H2O)2](2), tris(N-methylsalicylaldimine)cobalt(III) [Co(salmen)3](3), tris(N-ethyl-salicylaldimine) cobalt(III) [Co(saletn)3](4), tris(N-n-propyl-salicylaldimine) cobalt(III) [Co(salprn)3](5),tris(N-n-butyl-salicylaldimine) cobalt(III) [Co(salbut)3](6), and tris(N-n-pentyl-salicylaldimine)cobalt(III) [Co(salptn)3](7). The as prepared Schiff base complexes prepared by template methodwere characterized by FTIR, UV-Vis and mass, NMR spectroscopy followed by CHNand TG/DTA analyses. Further, a single crystal analysis was done for the compound (7). Among these complexes,(3), (4), (5), (6) and (7) were found to be volatile and used in Thermal CVD for the development of nanocrystalline Cobalt Oxide thin films. The presence of Cobalt Oxide in these films was confirmed by XRD and SEM/EDAX analyses.

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